Tensor D Rinse
Additive for High Pressure Pad Rinse & Wafer De-Chucking Cycles
Tensor D Rinse Details
Product is available in 5-gallon pails and 55-gallon drums.
|Tensor D Rinse|
It is recommended that Tensor D-Rinse be added to the high-pressure water rinse line at 10% to 25%. The types of post-CMP residues, length of time under the spray, spray pressure, slurry chemistry and other process factors ultimately determine specific dilutions and methods of use.
Product should be stored in a temperature controlled environment. Prolonged exposure to temperatures at or below 32° Fahrenheit (0°C) is discouraged. Prolonged exposure to temperatures at or above 100° Fahrenheit (38°C) is also discouraged. In addition, material should always be sealed when not in use to prevent evaporation.
Dispose of in accordance with all applicable local regulations.