Category - Polishing Slurries

Dow ACuPLANE LK393c4

Copper Barrier Slurry

The LK393c4 Copper Barrier slurry, the latest addition to the LK Series, is an alkaline mixture of ultra-pure water, colloidal silica, and proprietary additives that enable its robust process performance. With a 1:1 selectivity of...

Base MaterialParticle Size (um)pHSolids Content
Colloidal Silica0.05010.412
Category - Polishing Slurries

Dow® CUS1351

Copper Barrier Slurry

The CUS1351 barrier slurry for copper CMP was designed to improve upon the dishing and erosion results obtained after first step polishing while removing any residual copper present after the first step polishing process. CUS1351...

Base MaterialpHSolids Content
Colloidal Silica8.912.4%
Category - Polishing Slurries

Dow® Klebosol™ 1501-50

Industry standard CMP colloidal silica for ILD and STI

Klebosol slurry products are the most widely used colloidal silica products for CMP polishing.  These particles are grown and maintain excellent stability in their liquid medium.  Klebosol slurries have been shown to meet or exceed...

Base MaterialParticle Size (um)pHSolids ContentSpecific Gravity
Colloidal Silica0.05010.930.0%1.21
Category - Polishing Slurries

Dow® Klebosol™ 1508-50

Industry Standard Colloidal Silica Slurries for CMP

Klebosol slurry products are the most widely used colloidal silica products for CMP polishing. These particles are grown and maintain excellent stability in their liquid medium. Klebosol slurries have been shown to meet or exceed...

Base MaterialParticle Size (um)pHSolids ContentSpecific Gravity
Colloidal Silica0.05010.930.0%1.21
Category - Polishing Slurries

Dow® Klebosol™ 1630/16

Industry Standard Colloidal Silica Slurries for CMP

Klebosol slurry products are the most widely used colloidal silica products for CMP polishing. These particles are grown and maintain excellent stability in their liquid medium. Klebosol slurries have been shown to meet or exceed...

Base MaterialParticle Size (um)pHSolids ContentSpecific Gravity
Colloidal Silica0.12010.716.0%1.21
Category - Polishing Slurries

Dow® Klebosol™ 1630/26

Industry Standard Colloidal Silica Slurries for CMP

Klebosol slurry products are the most widely used colloidal silica products for CMP polishing. These particles are grown and maintain excellent stability in their liquid medium. Klebosol slurries have been shown to meet or exceed...

Base MaterialParticle Size (um)pHSolids ContentSpecific Gravity
Colloidal Silica0.12010.726.0%1.21
Category - Polishing Slurries

Dow® Klebosol™ 30H50

Industry Standard Colloidal Silica Slurries for CMP

Klebosol slurry products are the most widely used colloidal silica products for CMP polishing. These particles are grown and maintain excellent stability in their liquid medium. Klebosol slurries have been shown to meet or exceed...

Applications: Tungsten

Base MaterialParticle Size (um)pHSolids ContentSpecific Gravity
Colloidal Silica0.0502.030.0%1.21
Category - Polishing Slurries

Dow® Klebosol™ 30N50

Industry Standard Colloidal Silica Slurries for CMP

Klebosol slurry products are the most widely used colloidal silica products for CMP polishing. These particles are grown and maintain excellent stability in their liquid medium. Klebosol slurries have been shown to meet or exceed...

Base MaterialParticle Size (um)pHSolids ContentSpecific Gravity
Colloidal Silica0.05010.030.0%1.21
Category - Polishing Slurries

Dow® Klebosol™ 30N50PHN

Industry Standard Colloidal Silica Slurries for CMP

Klebosol slurry products are the most widely used colloidal silica products for CMP polishing. These particles are grown and maintain excellent stability in their liquid medium. Klebosol slurries have been shown to meet or exceed...

Base MaterialParticle Size (um)pHSolids ContentSpecific Gravity
Colloidal Silica0.05010.930.0%1.21
Category - Polishing Slurries

Dow® Klebosol™ 40PA50

Industry Standard Colloidal Silica Slurries for CMP

Klebosol slurry products are the most widely used colloidal silica products for CMP polishing. These particles are grown and maintain excellent stability in their liquid medium. Klebosol slurries have been shown to meet or exceed...

Base MaterialParticle Size (um)Specific Gravity
Colloidal Silica0.0501.30
Category - Polishing Slurries

Nalco™ 2329

Colloidal Silica Dioxide

NALCO 2329is a colloidal dispersion of submicron-sized silica particles in the form of tiny spheres, in an alkaline aqueous solution. NALCO 2329has a negative surface charge and is ammonium stabilized. Primary Benefits High silica concentrationOptical clarity Primary Applications Binder...

Base MaterialParticle Size (um)pHSolids ContentSpecific Gravity
Colloidal Silica0.0758.440.0%1.29
Category - Polishing Slurries

Nalco™ 2350

Standard Colloidal Silica

Nalco's benchmark stock polishing slurry, the2350 is a colloidal silicaspecifically formulated for applications where a balance of removal rate and surface quality is desired.Nalco 2350 is one of the most widely used silicon polishing slurries...

Base MaterialParticle Size (um)pHSolids ContentSpecific Gravity
Colloidal Silica0.06011.050.0%1.39
Category - Polishing Slurries

Nalco™ 2354

Standard Colloidal Silica

Nalco 2354 is a colloidal silica polishing slurry specifically formulated for extended pad life through minimization of pad glazing.Nalco 2354 features a 15-20% higher removal rate than Nalco 2350, at the cost of rougher surface...

Base MaterialParticle Size (um)pHSolids ContentSpecific Gravity
Colloidal Silica0.06012.046.0%1.35
Category - Polishing Slurries

Nalco™ 2358

Colloidal Silica for Stock Removal on Silicon

Nalco 2358 is a colloidal silica polishing slurry specifically formulated as a next generation replacement to the Nalco 2350. It contains lower metals than 2350, and typically yields a 10-15% higher removal rate.This is espcially...

Applications: Silicon

Base MaterialParticle Size (um)pHSolids ContentSpecific Gravity
Colloidal Silica0.07012.028.0%1.19
Category - Polishing Slurries

Nalco™ 2360

Colloidal Silica for Final Finish on Silicon

Nalco 2360 is a standard colloidal silica slurry originally designed for final polish of silicon. It features a proprietary blend of three custom particle sizes,high concentration, anda low cost of ownership.

Applications: Silicon

Base MaterialParticle Size (um)pHSolids ContentSpecific Gravity
Colloidal Silica0.0608.550.0%1.39
Category - Polishing Slurries

Nalco™ 2371

Standard Colloidal Silica

Nalco 2371 is a colloidal silica polishing slurry specifically designed to meet the requirements of recirculated stock removal systems and low sodium levels. The level of sodium ion impurities in this slurry has been minimized...

Base MaterialParticle Size (um)pHSolids ContentSpecific Gravity
Colloidal Silica0.07011.828.0%1.19
Category - Polishing Slurries

Nalco™ 2398

Colloidal Silica for Stock Removal on Silicon

Nalco 2398 is a colloidal silica polishing slurryspecifically designed to lower the residual metals levels on wafers after the stock polishing process. The chemical additive package specifically targets copper ions to prevent their transfer into...

Base MaterialParticle Size (um)pHSolids ContentSpecific Gravity
Colloidal Silica0.08511.828.0%1.19
Category - Polishing Slurries

NanoArc® CE-6450

High Purity Nanoparticle Ceria Slurry

Designed to meet the demanding requirements of Chemical Mechanical Planarization and other Precision Polishing applications, Nanophase nano-ceria materials combine a fully designed structure with high purity.  NanoArc CE-6450 is designed for super polish applications where...

Applications: Fused Silica, Glass

Base MaterialParticle Size (um)pHSolids Content
Cerium Oxide0.0308.018%
Category - Polishing Slurries

NP1000

Nanopure Stock Polishing Slurry

The NP 1000 series final polishing slurries are high purity products designed for the demanding requirements of final polishing of silicon wafers. These slurries have been formulated using the cleanest colloidal silica available along with...

Applications: Silicon

Base Material
Colloidal Silica
Category - Polishing Slurries

NP8020

Nanopure Final Polishing Slurry

The NP 8000 series final polishing slurries are high purity products designed for the demanding requirements of final polishing of silicon wafers. These slurries have been formulated using the cleanest colloidal silica available along with...

Applications: Silicon

Base MaterialParticle Size (um)pHSolids Content
Colloidal Silica0.07010.510.0%
Category - Polishing Slurries

NP8040

Nanopure Final Polishing Slurry

The NP 8000 series final polishing slurries are high purity products designed for the demanding requirements of final polishing of silicon wafers. These slurries have been formulated using the cleanest colloidal silica available along with...

Applications: Silicon

Base MaterialParticle Size (um)pHSolids ContentSpecific Gravity
Colloidal Silica0.07010.54.5%1.02
Category - Polishing Slurries

Ultra-Sol® 1000

Cerium Oxide Polishing Slurry

Ultra-Sol 1000 is an exceptionally uniform cerium oxide dispersion used extensively for general purpose polishing of glass, quartz, fused silica, and other silica-based optical materials. The alkaline (pH 9) slurry is formulated to provide...

Applications: Fused Silica, Glass, Zerodur

Base MaterialParticle Size (um)pHSolids ContentSpecific Gravity
Cerium Oxide1.1509.715.0%1.14
Category - Polishing Slurries

Ultra-Sol® 1000HP

High Purity Cerium Oxide Suspension

Ultra-Sol 1000HP is an extremely high purity, stable, precision cerium oxide polishing slurry used extensively for achieving sub-angstrom optical finishes on silica-based optical materials.  Polishing performance meets or exceeds industry specifications for sleek, scratch/dig, and...

Applications: Fused Silica, Glass, Zerodur

Base MaterialParticle Size (um)pHSolids ContentSpecific Gravity
Cerium Oxide0.9508.510.2%1.05
Category - Polishing Slurries

Ultra-Sol® 100Z

Acidic Zirconium Oxide Slurry

Ultra-Sol 100Z is an acidic high-purity zirconium oxidedispersion with proprietary additives for achieving sub-angstrom finishes on optical materials. The synergy between high-purity zirconium oxideand the unique proprietary additives in Ultra-Sol 100Z provides excellent removal rates...

Base MaterialParticle Size (um)pHSolids ContentSpecific Gravity
Zirconium1.9503.720.3%1.15
Category - Polishing Slurries

Ultra-Sol® 1040

High Purity Cerium Oxide Suspension

Ultra-Sol 1040 is a dispersion used extensively in precision polishing of glass, quartz, fused silica, and other silica-based optical materials. It is similar to the Ultra-Sol 1000, but with significantly higher concentration. The alkaline...

Applications: Fused Silica, Glass

Base MaterialParticle Size (um)pHSolids ContentSpecific Gravity
Cerium Oxide1.1509.240.6%1.53
Category - Polishing Slurries

Ultra-Sol® 200A

Advanced Particle Slurry

Ultra-Sol 200A is a unique colloidal alumina slurry with proven results in polishing a wide variety of materials.  Being an industry standard slurry for over fifteen years, 200A continues to be the process of record...

Applications: Aluminum, Cadmium Zinc Telluride, Gallium Arsenide, Indium Phosphide, Nickel, Spinel, Zinc Selenide

Base MaterialParticle Size (um)pHSolids ContentSpecific Gravity
Aluminum Oxide0.1004.020.0%1.14