Category - Polishing Pads

DF200

Standard CMP Backing Film

The original pad material created both for polishing and backing films, the DF200 continues to be an industry standard in many industries. As a finishing pad, it's quality construction yields excellent surface finish, lifetime, and flatness.

Base Material Thickness (mils) Compressibility
Poromeric 25 10 %
Category - Polishing Pads

Dow® IC1000™ Polishing Pads

The Industry Standard for Chemical Mechanical Planarization

IC1000™ pad is the industry-standard polishing pad for chemical mechanical planarization (CMP). The IC1000 pad is made of a rigid, micro-porous polyurethane material. These properties enable the IC1000 pad to deliver localized planarization, excellent removal rates,…

Applications: Berylium, Germanium, Indium Phosphide, Nickel, Polysilicon, Sapphire, Silicon Carbide, Tungsten, Zinc Selenide

Base Material Thickness (mils) Compressibility Hardness Hardness
Urethane 50 2.25 % Shore D 57
Category - Polishing Pads

Dow® IC1010™ Chemical Mechanical Polishing Pads

The Industry Standard for Chemical Mechanical Planarization

The IC1010™ polishing pad is designed for optimal chemical mechanical planarization (CMP) performance on the Applied Materials Mirra and Reflexion polisher platforms. The IC1010 pad is a rigid microporous polyurethane pad with a proprietary radial grooving…

Applications: Berylium, Germanium, Indium Phosphide, Nickel, Polysilicon, Sapphire, Silicon Carbide, Tungsten, Zinc Selenide

Base Material Thickness (mils) Compressibility Hardness Hardness
Urethane 80 2.25 % Shore D 57
Category - Polishing Pads

Dow® IC1010™ Chemical Mechanical Polishing Pads with Window

The Industry Standard for Chemical Mechanical Planarization

The IC1010™ polishing pad is designed for optimal chemical mechanical planarization (CMP) performance on the Applied Materials Mirra and Reflexion polisher platforms. The IC1010 pad is a rigid microporous polyurethane pad with a proprietary radial grooving…

Applications: Berylium, Germanium, Indium Phosphide, Nickel, Polysilicon, Sapphire, Silicon Carbide, Tungsten, Zinc Selenide

Base Material Thickness (mils) Compressibility Hardness Hardness
Urethane 80 2.25 % Shore D 57
Category - Polishing Pads

EXTERION(TM)

Exterion polishing pads

EXTERION pads are an advanced urethane with ceria filler, specifically formulated to meet the needs of different glass and optical polishing applications. The unique and controlled pore structure differenciate them from competitor pads in both performance and…

Applications: Acryllic, Ceramic, Crystal Quartz, Glass, Glass, Aluminosilicate, Glass, APEX, Glass, BK7, Glass, BK9, Glass, Borofloat, Glass, Borosilicate, Glass, Gorrilla, Glass, Leaded Crystal, Glass, Phosphate, Glass, Pyrex, Glass, SF6 Flint, Glass, Soda Lime - Float, Glass, Zinc Borosilicate

Base Material Thickness (mils) Compressibility Hardness Hardness
Urethane 50 3 % JIS 86
Category - Polishing Pads

FP5

Robust Poromeric Finishing Pad

Developed in-house by Eminess Technologies, the FP5 finishing pad offers a more robust alternative to Politex. In many applications it has demonstrated longer life to unique pore structure. It is a popular alternative for customers who…

Applications: Cadmium Zinc Telluride, Gallium Arsenide

Base Material Thickness (mils) Compressibility
Poromeric 55.1 12 %
Category - Polishing Pads

GS Polishing Pad 0.150"

Polyurethane Impregnated Non-Woven Felt Pad

GS is a non-woven material which combines a uniform, moderately permeable pore structure with a firm, dense base. GS is ideal for aggressive polishing processes. The GS material is particularly effective in replacing wool and other…

Applications: Glass, Zerodur

Base Material Thickness (mils) Compressibility Hardness Hardness
Felt 150 5 % Shore D 45
Category - Polishing Pads

GS Polishing Pad 0.180"

Polyurethane Impregnated Non-Woven Felt Pad

GS is a non-woven material which combines a uniform, moderately permeable pore structure with a firm, dense base. GS is ideal for aggressive polishing processes. The GS material is particularly effective in replacing wool and other…

Applications: Glass, Zerodur

Base Material Thickness (mils) Compressibility Hardness Hardness
Felt 180 5 % Shore D 45
Category - Polishing Pads

GS Polishing Pad 0.220"

Polyurethane Impregnated Non-Woven Felt Pad

GS is a non-woven material which combines a uniform, moderately permeable pore structure with a firm, dense base. GS is ideal for aggressive polishing processes. The GS material is particularly effective in replacing wool and other…

Applications: Glass, Zerodur

Base Material Thickness (mils) Compressibility Hardness Hardness
Felt 220 5 % Shore D 45
Category - Polishing Pads

IC OPTIC

IC Optic

Next generation optical surfaces will be manufactured in rigorous, predictive, process-controlled environments.   Recognizing that your polishing consumables require that same consistency, Eminess is pleased to offer IC OPTIC.  Made from the same controlled variation-free material…

Applications: Berylium, Cleartran - Zn Su Multi-spectral, Ceramic, Crystal Quartz, Fused Silica, Germanium, Glass, Glass, Aluminosilicate, Glass, APEX, Glass, BK7, Glass, BK9, Glass, Borofloat, Glass, Borosilicate, Glass, Gorrilla, Glass, Leaded Crystal, Glass, Phosphate, Glass, Pyrex, Glass, SF6 Flint, Glass, Soda Lime - Float, Glass, Zinc Borosilicate, Poly Carbonate lens, Quartz, Fused, Zerodur, Zinc, Zinc Selenide, Zinc Sulfide

Category - Polishing Pads

MHN15A020

Advanced Polyurethane Pads

MH polishing pads are uniquely designed for polishing and finishing a wide variety of surfaces where flatness and ultra-precision surface finish is critical. These materials include glass surfaces, ceramic components, precision lenses, semiconductor wafers and aluminum…

Applications: Berylium, Cadmium Zinc Telluride, Calcium Fluoride, Fused Silica, Lithium Niobate, Lithium Tantalate, Sapphire, Stainless Steel

Base Material Thickness (mils) Compressibility Hardness Hardness
Urethane 20 3.05 % JIS 84
Category - Polishing Pads

MHN15A039

Advanced Polyurethane Pads

MH polishing pads are uniquely designed for polishing and finishing a wide variety of surfaces where flatness and ultra-precision surface finish is critical. These materials include glass surfaces, ceramic components, precision lenses, semiconductor wafers and aluminum…

Applications: Berylium, Cadmium Zinc Telluride, Calcium Fluoride, Fused Silica, Lithium Niobate, Lithium Tantalate, Sapphire, Stainless Steel

Base Material Thickness (mils) Compressibility Hardness Hardness
Urethane 39 3.05 % JIS 84