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+ Semi-Conductor Chemical Mechanical Planarization (CMP)
Interlayer Dielectric (ILD)
Shallow Trench Isolation (STI)
Tungsten
Copper
Polysilicon
Platinum
+ Specialty Substrate CMP Polishing
Nickel Iron NiFe
Nickel Iron Cobalt NiFeCo
Quartz SiO2
Sapphire Al2O3
Gallium Arsenide GaAs
Gallium Antimonide GaSb
Gallium Nitride GaN
Indium Phosphide InP
Indium Gallium Phosphide InGaP
Lithium Niobate LiNbO3
Lithium Tantalate LiTaO3
Aluminum Nitride AlN
Silicon Germanium SiG
Silicon Carbide SiC
Yttrium Aluminum Garnet YAG
+ Magneto-Resistive Device Polishing
Nickel Iron NiFe, Nickel Iron Cobalt NiFeCo
+ NEW Products
EMINESS Specialty Substrate Slurries
+ Ultra-Sol™ Slurries
Ultra-Sol™ Ceria Slurries
Ultra-Sol™ Silica Slurries
Ultra-Sol™ Zirconia Slurries
Ultra-Sol™ Alumina Slurries
Ultra-Sol™ Fiber Optics Slurries
Ultra-Sol™ Diamond Suspensions
+ Polishing Systems
Glass Polishing Systems
Optical Polishing: Colloidal Silica
Optical Polishing: Colloidal Alumina
Fiber Optic Polishing System
Specialty Slurries
Ultra-Lox™ Powders
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GLASS POLISHING SYSTEMS

Benefits

Rohm and Haas™ (formerly Rodel®) high quality pads and Eminess's slurries provide consistent yield improvements in glass polishing processes. We offer a variety of products that perform to meet industry specifications such as sleek, scratch/dig, surface finish and elimination of sub-surface work damage.


Pads

MH SERIES - A porous polyurethane material available in a variety of hardnesses with and without ceria abrasives. MH is excellent for fixed abrasive lapping providing high removal rates and good flatness.

SUBA® SERIES - Porous, polyurethane-impregnated felts available in a variety of hardnesses and compressibility ranges specifically designed to meet the challenging removal rates, flatness and waviness requirements for stock polishing.

GS SERIES - A thick, moderately soft, polyurethane-impregnated felt. GS is a durable pad ideal for acrylic polishing.

POLITEX® - Rohm and Haas (formerly Rodel®) signature technology, this soft, poromeric pad was designed for final polishing a variety of substrates. Politex pads are available with a longer nap height to provide superior surface roughness.


Slurries

ULTRA-SOL™ 1000 - A rare earth oxide dispersion used extensively in percision polishing of glass, quartz, fused silica, and other silica-based optical materials. Can be produced with a pH between 7 and 8.

ULTRA-SOL™ 1000HP - Made from high-purity ceria and used for sub-angstrom optical finishes on silica-based materials. Can be produced with a pH between 7 and 8.

ULTRA-SOL™ 1040 - Similar to Ultra-Sol 1000 but more concentrated. Provides high polish and low Rms on most silica-based material. May be diluted in concentrations of 10:1 or 20:1.


Suggested Consumable Combinations

Applications GS Suba Series MH Series Politex Ultra-Sol™ 1000 Ultra-Sol™ 1000HP Ultra-Sol™ 1040
Quartz   X   X X X X
LCD Glass     X   X   X
Photomasks   X X   X X  
Opthalmic X       X    
Precision Lenses X   X   X X X

Product Properties

Pads

Product Average Thickness Average Hardness Average Compressibility (%) VO (Vertical Pore Height) Specific Gravity
MH SERIES
MH C14B .059 inch 79 (JIS-A) N/A N/A 0.42
MH N15A 0.039 inch 85 (JIS-A) N/A N/A 0.53
SUBA® SERIES
500 .050" 72 (Shore A) 7 N/A N/A
550 .050" 73 (Shore A) 6 N/A N/A
H2 .050" 81 (Shore A) 7 N/A N/A
IV .050" 61 (Shore A) 15 N/A N/A
X .050" 66 (Shore A) 10 N/A N/A
GS SERIES
GS BB .150 67 (Shore A) 10 N/A N/A
GS BK .220 67 (Shore A) N/A N/A N/A
POLITEX® SERIES
POLITEX® REG .056 N/A N/A N/A N/A
POLITEX® HIGH .060 N/A N/A N/A N/A
These values represent typical measurements. Actual values may vary in a range defined by product specifications.

Slurries

Product pH Solids(%) Mean Particle Size Color
ULTRA-SOL™ 1000 alkaline 15 1.0µ Beige
ULTRA-SOL™ 1000HP alkaline 10 0.5µ White
ULTRA-SOL™ 1040 alkaline 40 1.0µ Brown
These values represent typical measurements. Actual values may vary in a range defined by product specifications.

FOR CUSTOM REQUESTS, PRICING, OR ORDERING INFORMATION

CALL 1-888-899-1942