COLLOIDAL ALUMINA OPTICAL POLISHING SYSTEMS

Benefits

Eminess offers total solutions for colloidal alumina optical polishing to fulfill the industry's chemical mechanical polishing needs. Theses slurries have a low acidic dispersion and can be manufactured in a broad range of particle sizes.

Pads

IC1000™- A hard, minimally compressible, microporous polyurethane material designed to provide excellent removal rates and local planarization.

SUBA® SERIES - Porous, polyurethane-impregnated felts available in a variety of hardnesses and compressibility ranges specifically designed to meet the challenging removal rates, flatness and waviness requirements for stock polishing.

POLITEX® - Grown in-place porometic that incorporates a unique, vertically oriented pore structure with a compressible substrate. Designed to instantaneously recover from polishing compression by enhancing slurry flow in the pad and reducing pad loading.

Slurries

ULTRA-SOL™ 200A - An acidic dispersion, its chemical-mechanical action provides asuperior surface finishes on a wide variety of applications including II-VI materials, ferrites and carbides. Ultra-Sol's low scatter finishes have also been obtained on pure metals, epoxy resins and plastics.

ULTRA-SOL™ 201A/280,  ULTRA-SOL™ 201A/140,  ULTRA-SOL™ 201A/60 - These slurries are effective on the same materials as the 200A slurry but provide a better solution for your process when a finer particle is required. All of these slurries can be used in full concentration or diluted with filtered, deionized water. The only difference between these slurries is their particle size. The smaller the particle, the finer the finish.

Suggested Consumable Combinations

Product Properties

Pads

Slurries

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